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新方法将用于制造锗晶体薄膜

2026-10-16 来源:未知 作者:admin
Researchers have developed a new technique to produce thin films of germanium(锗) crystals -- key components1 for next-generation electronic devices such as advanced large-scale integrated circuits and flexible electronics, which are required for gadgets2 that move or bend. Unlike conventional methods, the new approach does not require high temperatures or other crystals to act as seeds to grow the germanium crystal. And, the researchers say, the new method can be used to produce germanium films with a very large area, allowing for more potential applications.   "This is the realization3 of the dreams of crystal-growth researchers," says Taizoh Sadoh of Kyushu University. "This unique method will open new ways to create advanced flexible electronics."   Sadoh is an author of the paper describing the new work, which appears in the AIP Publishing journal Applied4 Physics Letters.   Charged particles move through germanium more readily than they do through silicon5, making germanium a good material for electronics. In particular, it is a promising6 material for the thin-film transistors7 that are needed for flexible electronics. However, for use in flexible electronics, the germanium would have to be grown on malleable8(可塑的) materials, which tend to soften9 at temperatures above 300° Celsius10. The challenge, said Sadoh, is to grow germanium at lower temperatures.   Using gold as a catalyst11, Sadoh and his colleagues were able to grow germanium crystals at a temperature of about 250° Celsius. They were also able to grow them in such a way that their crystal structure has the proper orientation12 and electrical properties necessary for technological13 applications.

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